| سال | هفته | ID | Title | ApplNo | IPC | Applicant | Subgroup | زیر گروه | رشته | شرح | Description |
|---|
2026 | 04 | WO/2026/017337 | METHOD, COMPUTER PROGRAM AND ASSEMBLY FOR PELLICLE MONITORING | EP2025/066679 | G03F 1/84 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 04 | WO/2026/017339 | METHOD OF CONFIGURING A SUBSTRATE POSITIONING SYSTEM OF A SEMICONDUCTOR MANUFACTURING TOOL | EP2025/066694 | G03F 9/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 04 | WO/2026/017503 | METHOD OF CORRECTING AN IMAGE | EP2025/069526 | G03F 7/20 | STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN | PHYSICS | فیزیک | ابزارها | 2026 | 04 | WO/2026/018233 | EXTREME ULTRAVIOLET MASK INSPECTION – LASER INTERFEROMETER OPTICAL ALIGNMENT | IL2024/050689 | G03F 7/20 | CARL ZEISS SMS LTD. | PHYSICS | فیزیک | ابزارها | 2026 | 04 | WO/2026/018754 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, AND POLYMER | JP2025/024638 | G03F 7/11 | JSR CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 04 | WO/2026/018759 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JP2025/024708 | G03F 7/039 | TOKYO OHKA KOGYO CO., LTD. | PHYSICS | فیزیک | ابزارها | 2026 | 04 | WO/2026/018785 | RESIST MATERIAL, AND PATTERN FORMATION METHOD | JP2025/024938 | G03F 7/004 | TOKYO OHKA KOGYO CO., LTD. | PHYSICS | فیزیک | ابزارها | 2026 | 04 | WO/2026/018910 | RADIATION-SENSITIVE COMPOSITION FOR FORMING GATE INSULATING FILM, PATTERN, METHOD FOR PRODUCING PATTERN, CURED FILM FOR GATE INSULATING FILM, SEMICONDUCTOR ELEMENT, ORGANIC ELECTROCHEMICAL TRANSISTOR, ORGANIC EL DISPLAY DEVICE, LIQUID CRYSTAL DISPLAY DEVICE, MICRO-LED DISPLAY DEVICE, QUANTUM DOT LIGHT-EMITTING DISPLAY DEVICE, WEARABLE DEVICE, ELECTRONIC SKIN DEVICE, BIOLOGICAL SENSOR, AND NEUROMORPHIC DEVICE | JP2025/025667 | G03F 7/004 | JSR CORPORATION | PHYSICS | فیزیک | ابزارها |